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Controlling Piezoelectric Responses in Pb(Zr0.52Ti0.48)O3 Films through Deposition Conditions and Nanosheet Buffer Layers on Glass

机译:通过沉积条件和玻璃上的纳米片缓冲层控制Pb(Zr0.52Ti0.48)O3薄膜中的压电响应

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摘要

Nanosheet Ca2Nb3O10 (CNOns) layers were deposited on ultralow expansion glass substrates by the Langmuir-Blodgett method to obtain preferential (001)-oriented growth of Pb(Zr0.52Ti0.48)O3 (PZT) thin films using pulsed laser deposition (PLD) to enhance the ferroelectric and piezoelectric properties of the films. The PLD deposition temperature and repetition frequency used for the deposition of the PZT films were found to play a key role in the precise control of the microstructure and therefore of the ferroelectric and piezoelectric properties. A film deposited at a high repetition frequency has a columnar grain structure, which helps to increase the longitudinal piezoelectric coefficient (d33f). An enhanced d33f value of 356 pm V-1 was obtained for 2-μm-thick PZT films on CNOns/glass substrates. This high value is ascribed to the preferential alignment of the crystalline [001] axis normal to the substrate surface and the open columnar structure. Large displacement actuators based on such PZT films grown on CNOns/glass substrates should be useful in smart X-ray optics applications.
机译:纳米片Ca2Nb3O10(CNOns)层通过Langmuir-Blodgett方法沉积在超低膨胀玻璃基板上,使用脉冲激光沉积(PLD)获得Pb(Zr0.52Ti0.48)O3(PZT)薄膜的优先(001)定向生长。增强薄膜的铁电和压电性能。发现用于沉积PZT膜的PLD沉积温度和重复频率在精确控制微观结构以及铁电和压电特性中起着关键作用。以高重复频率沉积的膜具有柱状晶粒结构,这有助于增加纵向压电系数(d33f)。对于CNOns /玻璃基板上2μm厚的PZT膜,获得的d33f值提高了356 pm V-1。该高值归因于垂直于基板表面的结晶[001]轴和开放的柱状结构的优先取向。基于在CNOns /玻璃基板上生长的此类PZT膜的大位移执行器应在智能X射线光学应用中有用。

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